CVD coating is the first to appear, is the most common coating method, has been used for many years. The CVD method is to heat the substrate in a chemical reaction vessel and expose the substrate to the air stream. These gases are decomposed on the surface of the heated substrate to form a layer of coating. In general, the CVD coating requires a temperature of about 1,000 ° C.

     A common CVD coating is the use of three gases - titanium tetrachloride (TiCl4), hydrogen (H2) and nitrogen (N2) - to produce titanium nitride (TiN) + hydrogen chloride (HCl). HCl is the secondary product of the process and must be treated in accordance with stringent environmental regulations.

     The advantages of the CVD method include excellent coating adhesion and uniformity of coating distribution. The drawback of the CVD method is that the high temperature at the time of coating will adversely affect the substrate, and there are not many suitable coating materials (since the coating material is provided in gaseous form) and the process cycle is long.